Read e-book online Advances in CMP Polishing Technologies PDF

By Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa

CMP and sprucing are the main specific approaches used to complete the surfaces of mechanical and digital or semiconductor parts. Advances in CMP/Polishing applied sciences for Manufacture of digital units offers the most recent advancements and technological concepts within the box – making state of the art R&D available to the broader engineering neighborhood.

Most of the purposes of those approaches are saved as personal as attainable (proprietary information), and particular info usually are not noticeable in specialist or technical journals and magazines. This publication makes those techniques and purposes obtainable to a much broader commercial and educational audience.

Building at the basics of tribology – the technological know-how of friction, put on and lubrication – the authors discover the sensible purposes of CMP and sharpening throughout quite a few industry sectors. as a result of excessive speed of improvement of the electronics and semiconductors undefined, the various provided techniques and purposes come from those industries.

  • Demystifies medical advancements and technological suggestions, establishing them up for brand new purposes and strategy advancements within the semiconductor and different parts of precision engineering
  • Explores inventory removing mechanisms in CMP and sharpening, and the demanding situations keen on predicting the results of abrasive techniques in high-precision environments
  • The authors assemble the newest recommendations and learn from the us and Japan

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Advances in CMP Polishing Technologies by Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa

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